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Highly efficient colloid–solution deposition planarization of Hastelloy substrate for IBAD-MgO film

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Abstract

A simple and efficient way to planarize Hastelloy substrate for high-temperature superconductors has been developed. The colloid–solution deposition planarization (CSDP) method consists of two steps: colloid deposition planarization and subsequent precursor solution deposition planarization. The surface roughness of Hastelloy belt decreased from 4.0 to 0.8 nm after Y2O3 colloid deposition and then to 0.3 nm after further yttrium acetate solution deposition. The shrinkage percentage of the colloid deposition layer and solution deposition layer was 20 and 77 %, respectively. Compared with traditional solution deposition planarization, the higher planarization efficiency of CSDP can be attributed to the lower shrinkage percentage of the colloid deposition layer. As a result, ion-beam-assisted deposition (IBAD)-MgO on Hastelloy substrate with CSDP coating showed crystal orientation. Hastelloy belt planarized by the CSDP method will provide a low-cost substrate for high-temperature superconductors.

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Acknowledgments

The authors acknowledge support from the Shanghai Municipal Science and Technology Commission (13DZ2292100, 11DZ1100302) and Baoshan District Science and Technology Commission of Shanghai (bkw2013142).

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Authors and Affiliations

  1. School of Medical Instrument and Food Engineering, University of Shanghai for Science and Technology, Shanghai, 200093, China

    Hualan Zhou

  2. Department of Chemistry, Shanghai University, Shanghai, 200444, China

    Fangfang Chai & Jianhui Fang

  3. Shanghai Key Laboratory of High Temperature Superconductors, Shanghai University, Shanghai, 200444, China

    Jianhui Fang, Chuanbing Cai & Shuai Yuan

  4. Research Center of Nanoscience and Nanotechnology, Shanghai University, Shanghai, 200444, China

    Liyi Shi & Shuai Yuan

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  1. Hualan Zhou
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Correspondence to Jianhui Fang or Shuai Yuan.

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The authors Hualan Zhou, Fangfang Chai, Jianhui Fang, Liyi Shi, Chuanbing Cai, and Shuai Yuan declare that they have no conflicts of interest. The research described in this paper did not involve human participants or animals.

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Zhou, H., Chai, F., Fang, J. et al. Highly efficient colloid–solution deposition planarization of Hastelloy substrate for IBAD-MgO film. Res Chem Intermed 42, 4751–4758 (2016). https://doi.org/10.1007/s11164-015-2314-9

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